Colloidal Lithography Platform

Colloidal Lithography Platform


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Surfaces with ordered nanostructures have shown broad application prospects in various important technical fields due to their unique surface properties. Among various surface lithography techniques, colloid-based lithography has the advantages of low cost, high throughput, easy control, and simple equipment. Alfa Chemistry's colloidal lithography technology platform has advanced technology, which can precisely control the nano-topography of the colloidal surface and design colloidal materials with special properties for customers.

Overview of lithography steps and scanning electron microscope imagesFig.1 Overview of lithography steps and scanning electron microscope images[1]

Our Abilities

Alfa Chemistry is able to provide monolayer colloidal crystal modification and a range of lithographic patterning methods.

Monolayer Colloidal Crystal Modification

We are able to combine monolayers of colloidal crystals composed of polymers or silica with functional molecules or materials prior to colloidal lithography, giving the colloids additional properties. For example, intercalation of fluorescent dyes, modification with protein molecules, bonding with surfaces containing specific functional groups, etc.

Functionalization of colloids. Fig. 2 Functionalization of colloids. (A) For photoswitchable colloids; (B) For chiroptical response; (C) For successive assembly.[2]

Functional Material Patterning

It mainly includes physical deposition and chemical deposition. Among them, physical deposition is divided into vapor deposition and catalytic growth technology. We are able to utilize custom software for design, extending the variety and complexity of structures. Electroless deposition is the use of electrochemical deposition or electroless plating to deposit a variety of metals and semiconductors.

Pattern Transfer Technology

Alfa Chemistry is able to prepare large-area arrays containing various functional materials using lithography-assisted techniques based on monolayer colloidal crystals. We use two etching methods: dry etching and wet etching. Dry etching has the advantages of high selectivity, controllability, and repeatability, while wet etching is more cost-effective. Using these two methods, we can fabricate a wide variety of nanostructures on a variety of materials, including polymers, silicon, silicon dioxide, carbon materials, metals, and other semiconductors.

Colloidal Lithography Platform Fig. 3 (A)Dry etching routes for shaping the underlying substrates;[3] (B)Wet etching routes for shaping the underlying substrates.[4]

Our Advantages

  • Alfa Chemistry uses simple, low-cost and highly controllable colloidal lithography to fabricate nanostructures.
  • We can highly control the size, morphology and arrangement of nanostructures, changing the inherent properties of materials and expanding potential applications.
  • We can develop customized patterns according to the needs of customers, with a high degree of flexibility.
  • Alfa Chemistry's R&D technicians are good at combining colloidal lithography with other sophisticated methods to discover more novel structures.


  1. Wood, M. A. Colloidal lithography and current fabrication techniques producing in-plane nanotopography for biological applications. Journal of The Royal Society Interface. 2007.
  2. Wang Y, et al. Advanced colloidal lithography: From patterning to applications. Nano Today. 2018.
  3. Liu X, et al. Templated fabrication of periodic arrays of metallic and silicon nanorings with complex nanostructures. Nanotechnology. 2015.
  4. Teng, Ning, et al. Precise regulation of tilt angle of Si nanostructures via metal-assisted chemical etching. Nanoscale. 2017.

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